The corrosion resistance and microstructure of ubm system-deposited nbxsiynz thin films

NbxSiyNz thin film nanostructure was grown using the unbalanced magnetron sputtering (UBM) technique with varying Si content. Corrosion resistance was evaluated by potentiodynamic polarisation technique in a 3% NaCl solution. Microstructure was analysed by X-ray diffraction (XRD), scanning electron microscopy (SEM) and laser scanning microscopy. Chemical composition was ascertained by X-ray fluorescence (XRF) technique. The results showed that deposition rates increased with higher Si content. A microstructural change was observed for greater than 5% Si content through the transition from a crystalline to an amorphous structure in the thin films. Corrosion test results demonstrated that the thin films having the highest silicon content had better corrosion resistance.

• Autores: Velasco Estrada, Leonardo; Olaya Florez, Jhon Jairo; Rodríguez Baracaldo, Rodolfo
• Tipo de recurso: Article of journal
• Fecha de publicación: 2012
• Institución: Universidad Nacional de Colombia
• Repositorio: Universidad Nacional de Colombia
• Idioma: spa
• OAI Identifier: oai:repositorio.unal.edu.co:unal/71097
• Acceso en línea: https://repositorio.unal.edu.co/handle/unal/71097; http://bdigital.unal.edu.co/35567/; http://bdigital.unal.edu.co/35567/2/
• Palabra clave: Mechanical Engineering; Material engineering; Corrosion; diffraction; spectroscopy; fluorescence; microstructure; microscopy; race track; x ray; thin film; sputtering; polarisation; Corrosión; Difracción; Espectroscopia; Fluorescencia; Microestructura; Microscopia; race track; Rayos X; Recubrimientos; Sputtering; Polarización
• Rights: openAccess
• License: Atribución-NoComercial 4.0 Internacional