Differences between thin films deposition systems in the production transition metal nitride

The progress in vacuum technology have enabled the development of advanced coatings processes such as plasma assisted systems, which can produce thin films of different composition and optimum properties, that cannot be collected for the same material. The techniques of Pulsed Arc, Ionic Implantatio...

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Autores:

Tipo de recurso:

Fecha de publicación:

2013

Institución:

Universidad de Medellín

Repositorio:

Repositorio UDEM

Idioma:

eng

OAI Identifier:

oai:repository.udem.edu.co:11407/2286

Acceso en línea:

http://hdl.handle.net/11407/2286

Palabra clave:

Direct observations
Gold nitride
Ionic implantation
Optimum properties
Production transition
Pulsed arc
Reactive ion
Thin films deposition
Binding energy
Coatings
Gold
Ion implantation
Nitrides
Physical vapor deposition
Thin films
Vacuum technology
Deposition

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http://purl.org/coar/access_right/c_16ec