Macroporous silicon: efficient antireflective layer on crystalline silicon

A macroporous silicon layer (ma-PS) electrochemically grown on crystalline silicon surface can be used as an efficient antireflective layer in optical devices as antireflection coating. In this work, we presented the ma-PS layers fabricated on crystalline silicon (c-Si) n-type and p +-type, obtained...

Full description

Autores:
Fonthal Rico, Faruk
Torres Chavez, Ivaldo
Rodríguez, Ángel
Tipo de recurso:
Article of journal
Fecha de publicación:
2011
Institución:
Universidad Autónoma de Occidente
Repositorio:
RED: Repositorio Educativo Digital UAO
Idioma:
eng
OAI Identifier:
oai:red.uao.edu.co:10614/11912
Acceso en línea:
http://hdl.handle.net/10614/11912
Palabra clave:
Porous Silicon
Crystalline silicon
Etching time
Electrochemical etching
Antireflective coating
Silicio poroso
Rights
openAccess
License
Derechos Reservados - Universidad Autónoma de Occidente
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network_name_str RED: Repositorio Educativo Digital UAO
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dc.title.eng.fl_str_mv Macroporous silicon: efficient antireflective layer on crystalline silicon
title Macroporous silicon: efficient antireflective layer on crystalline silicon
spellingShingle Macroporous silicon: efficient antireflective layer on crystalline silicon
Porous Silicon
Crystalline silicon
Etching time
Electrochemical etching
Antireflective coating
Silicio poroso
title_short Macroporous silicon: efficient antireflective layer on crystalline silicon
title_full Macroporous silicon: efficient antireflective layer on crystalline silicon
title_fullStr Macroporous silicon: efficient antireflective layer on crystalline silicon
title_full_unstemmed Macroporous silicon: efficient antireflective layer on crystalline silicon
title_sort Macroporous silicon: efficient antireflective layer on crystalline silicon
dc.creator.fl_str_mv Fonthal Rico, Faruk
Torres Chavez, Ivaldo
Rodríguez, Ángel
dc.contributor.author.none.fl_str_mv Fonthal Rico, Faruk
Torres Chavez, Ivaldo
Rodríguez, Ángel
dc.subject.eng.fl_str_mv Porous Silicon
Crystalline silicon
Etching time
Electrochemical etching
Antireflective coating
topic Porous Silicon
Crystalline silicon
Etching time
Electrochemical etching
Antireflective coating
Silicio poroso
dc.subject.armarc.spa.fl_str_mv Silicio poroso
description A macroporous silicon layer (ma-PS) electrochemically grown on crystalline silicon surface can be used as an efficient antireflective layer in optical devices as antireflection coating. In this work, we presented the ma-PS layers fabricated on crystalline silicon (c-Si) n-type and p +-type, obtained by electrochemical etching. The morphology, porosity, thickness of ma-PS layer can be adjusted by controlling the electrochemical formation conditions. The optical behaviour of the antireflective coating over the solar spectrum is determined, resulting in very low values of the normalized reflectivity coefficient (below ~1%). The reflectivity measurements were evaluated at 45° in the different samples of the ma-PS/c-Si
publishDate 2011
dc.date.issued.none.fl_str_mv 2011-07
dc.date.accessioned.none.fl_str_mv 2020-02-17T18:19:41Z
dc.date.available.none.fl_str_mv 2020-02-17T18:19:41Z
dc.type.spa.fl_str_mv Artículo de revista
dc.type.coar.fl_str_mv http://purl.org/coar/resource_type/c_2df8fbb1
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dc.type.content.eng.fl_str_mv Text
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dc.identifier.issn.spa.fl_str_mv 0957-4522
dc.identifier.uri.none.fl_str_mv http://hdl.handle.net/10614/11912
dc.identifier.doi.none.fl_str_mv 10.1007/s10854-010-0232-6
identifier_str_mv 0957-4522
10.1007/s10854-010-0232-6
url http://hdl.handle.net/10614/11912
dc.language.iso.spa.fl_str_mv eng
language eng
dc.relation.citationvolume.spa.fl_str_mv 22
dc.relation.cites.eng.fl_str_mv Fonthal, F., Torres, I. & Rodriguez, A. Macroporous silicon: efficient antireflective layer on crystalline silicon. Journal of Materials Science: Materials in Electronics. 22, (2011). https://doi.org/10.1007/s10854-010-0232-6
dc.relation.ispartofjournal.eng.fl_str_mv Journal of Materials Science: Materials in Electronics
dc.relation.references.none.fl_str_mv 1. A. Prasad, S. Balakrishnan, S.K. Jain, G.C. Jain, J. Electrochem. Soc. 129, 596 (1982)
2. L.T. Canham, Appl. Phys. Lett. 57, 1046 (1990)
3. S. Yae et al., Solar Ener. 80, 701 (2006)
4. B. Gonza´lez-Dı´az et al., Physica E 38, 215 (2007)
5. T.D. James et al., in International Conferrence on Nanoscience and Nanotechnology, (ICONN 2006, Brisbane, Australia, 2006
6. M.J. Huang, C.R. Yang, Y.C. Chiou, R.T. Lee, Solar Ener. Mat. Solar Cell 92, 13526 (2008)
7. N. Marrero, R. Guerrero-Lemus, B. Gonza´lez-Dı´az, D. Borchert, Thin Solid Film 517, 2648 (2009)
8. A.M. Rossi, H.G. Bohn, Phys. Status Solidi. (a) 202, 1644 (2005)
9. U. Gangopadhyay et al., Solar Ener. Mat. Solar Cell 91, 285 (2007)
10. F. Fonthal et al., in AIP Conferrence Proceedings VI RIAO/IX OPTILAS. vol. 992, (2008), p. 780
11. F. Fonthal, I. Torres, in 11th International Conferences on Advanced Materials, (ICAM 2009, Rio de Janeiro, Brazil 2009)
12. M.Y. Ghannam, A.A. Abouelsaood, A.S. Alomar, J. Poortmans, Solar Ener. Mat. Solar Cell 94, 850 (2010)
dc.rights.spa.fl_str_mv Derechos Reservados - Universidad Autónoma de Occidente
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rights_invalid_str_mv Derechos Reservados - Universidad Autónoma de Occidente
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institution Universidad Autónoma de Occidente
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spelling Fonthal Rico, Farukvirtual::1752-1Torres Chavez, Ivaldo67a9fd7389d476707548c7ff4d70480bRodríguez, ÁngelUniversidad Autónoma de Occidente. Calle 25 115-85. Km 2 vía Cali-Jamundí2020-02-17T18:19:41Z2020-02-17T18:19:41Z2011-070957-4522http://hdl.handle.net/10614/1191210.1007/s10854-010-0232-6A macroporous silicon layer (ma-PS) electrochemically grown on crystalline silicon surface can be used as an efficient antireflective layer in optical devices as antireflection coating. In this work, we presented the ma-PS layers fabricated on crystalline silicon (c-Si) n-type and p +-type, obtained by electrochemical etching. The morphology, porosity, thickness of ma-PS layer can be adjusted by controlling the electrochemical formation conditions. The optical behaviour of the antireflective coating over the solar spectrum is determined, resulting in very low values of the normalized reflectivity coefficient (below ~1%). The reflectivity measurements were evaluated at 45° in the different samples of the ma-PS/c-Siapplication/pdf7 páginasengspringerDerechos Reservados - Universidad Autónoma de Occidentehttps://creativecommons.org/licenses/by-nc-nd/4.0/info:eu-repo/semantics/openAccessAtribución-NoComercial-SinDerivadas 4.0 Internacional (CC BY-NC-ND 4.0)http://purl.org/coar/access_right/c_abf2Porous SiliconCrystalline siliconEtching timeElectrochemical etchingAntireflective coatingSilicio porosoMacroporous silicon: efficient antireflective layer on crystalline siliconArtículo de revistahttp://purl.org/coar/resource_type/c_6501http://purl.org/coar/resource_type/c_2df8fbb1Textinfo:eu-repo/semantics/articlehttp://purl.org/redcol/resource_type/ARTREFinfo:eu-repo/semantics/publishedVersionhttp://purl.org/coar/version/c_970fb48d4fbd8a8522Fonthal, F., Torres, I. & Rodriguez, A. Macroporous silicon: efficient antireflective layer on crystalline silicon. Journal of Materials Science: Materials in Electronics. 22, (2011). https://doi.org/10.1007/s10854-010-0232-6Journal of Materials Science: Materials in Electronics1. A. Prasad, S. Balakrishnan, S.K. Jain, G.C. Jain, J. Electrochem. Soc. 129, 596 (1982)2. L.T. Canham, Appl. Phys. Lett. 57, 1046 (1990)3. S. Yae et al., Solar Ener. 80, 701 (2006)4. B. Gonza´lez-Dı´az et al., Physica E 38, 215 (2007)5. T.D. James et al., in International Conferrence on Nanoscience and Nanotechnology, (ICONN 2006, Brisbane, Australia, 20066. M.J. Huang, C.R. Yang, Y.C. Chiou, R.T. Lee, Solar Ener. Mat. Solar Cell 92, 13526 (2008)7. N. Marrero, R. Guerrero-Lemus, B. Gonza´lez-Dı´az, D. Borchert, Thin Solid Film 517, 2648 (2009)8. A.M. Rossi, H.G. Bohn, Phys. Status Solidi. (a) 202, 1644 (2005)9. U. Gangopadhyay et al., Solar Ener. Mat. Solar Cell 91, 285 (2007)10. F. Fonthal et al., in AIP Conferrence Proceedings VI RIAO/IX OPTILAS. vol. 992, (2008), p. 78011. F. Fonthal, I. Torres, in 11th International Conferences on Advanced Materials, (ICAM 2009, Rio de Janeiro, Brazil 2009)12. M.Y. Ghannam, A.A. Abouelsaood, A.S. Alomar, J. Poortmans, Solar Ener. Mat. 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