Macroporous silicon: efficient antireflective layer on crystalline silicon
A macroporous silicon layer (ma-PS) electrochemically grown on crystalline silicon surface can be used as an efficient antireflective layer in optical devices as antireflection coating. In this work, we presented the ma-PS layers fabricated on crystalline silicon (c-Si) n-type and p +-type, obtained...
- Autores:
-
Fonthal Rico, Faruk
Torres Chavez, Ivaldo
Rodríguez, Ángel
- Tipo de recurso:
- Article of journal
- Fecha de publicación:
- 2011
- Institución:
- Universidad Autónoma de Occidente
- Repositorio:
- RED: Repositorio Educativo Digital UAO
- Idioma:
- eng
- OAI Identifier:
- oai:red.uao.edu.co:10614/11912
- Acceso en línea:
- http://hdl.handle.net/10614/11912
- Palabra clave:
- Porous Silicon
Crystalline silicon
Etching time
Electrochemical etching
Antireflective coating
Silicio poroso
- Rights
- openAccess
- License
- Derechos Reservados - Universidad Autónoma de Occidente