Structural and Morphological Properties of Titanium Aluminum Nitride Coatings Produced by Triode Magnetron Sputtering
TixAl1-xN coatings were grown using the triode magnetron sputtering technique varying the bias voltage between -40 V and -150V. The influence of bias voltage on structural and morphological properties was analyzed by means of energy dispersive spectroscop
- Autores:
-
Devia, D M
Rodriguez-Restrepo, L. V
Restrepo-Parra, E
- Tipo de recurso:
- Fecha de publicación:
- 2014
- Institución:
- Universidad EAFIT
- Repositorio:
- Repositorio EAFIT
- Idioma:
- eng
- OAI Identifier:
- oai:repository.eafit.edu.co:10784/14397
- Acceso en línea:
- http://hdl.handle.net/10784/14397
- Palabra clave:
- Tialn
Bias Voltage
Sputtering
Atomic Percentage
Xrd
Tialn
Voltaje De Polarización
Pulverización Catódica
Porcentaje Atómico
Drx
- Rights
- License
- Copyright (c) 2014 D M Devia, E Restrepo-Parra, J M Vélez-Restrepo
| Summary: | TixAl1-xN coatings were grown using the triode magnetron sputtering technique varying the bias voltage between -40 V and -150V. The influence of bias voltage on structural and morphological properties was analyzed by means of energy dispersive spectroscop |
|---|