Structural and Morphological Properties of Titanium Aluminum Nitride Coatings Produced by Triode Magnetron Sputtering

TixAl1-xN coatings were grown using the triode magnetron sputtering technique varying the bias voltage between -40 V and -150V. The influence of bias voltage on structural and morphological properties was analyzed by means of energy dispersive spectroscop

Autores:
Devia, D M
Rodriguez-Restrepo, L. V
Restrepo-Parra, E
Tipo de recurso:
Fecha de publicación:
2014
Institución:
Universidad EAFIT
Repositorio:
Repositorio EAFIT
Idioma:
eng
OAI Identifier:
oai:repository.eafit.edu.co:10784/14397
Acceso en línea:
http://hdl.handle.net/10784/14397
Palabra clave:
Tialn
Bias Voltage
Sputtering
Atomic Percentage
Xrd
Tialn
Voltaje De Polarización
Pulverización Catódica
Porcentaje Atómico
Drx
Rights
License
Copyright (c) 2014 D M Devia, E Restrepo-Parra, J M Vélez-Restrepo