Influence of substrate temperature on the microstructure of TiN/TiC
The TiN / TiC bilayers were deposited using the plasma-assisted vapor phase deposition (PAPVD) -Arch Pulsed technique, varying the substrate temperature in a range of 100-120 ± C, with intervals of 5 ± C. The coatings were analyzed by means of XPS and XRD. From the treatment of the signals of the na...
- Autores:
-
Devia, D M
Mesa, Fernando
Arango, Pedro José
- Tipo de recurso:
- Fecha de publicación:
- 2011
- Institución:
- Universidad EAFIT
- Repositorio:
- Repositorio EAFIT
- Idioma:
- spa
- OAI Identifier:
- oai:repository.eafit.edu.co:10784/14464
- Acceso en línea:
- http://hdl.handle.net/10784/14464
- Palabra clave:
- Pulsed Arc
Microstructure
Tin / Tic
Xps
Xrd
Arco Pulsado
Microestructura
Tin/Tic
Xps
Xrd
- Rights
- License
- Copyright (c) 2011 D M Devia, Fernando Mesa, Pedro José Arango