Simulación de un plasma de hidrógeno en un reactor de microondas TM112 para la deposición de diamante

Autores:: Martinez, Alejandro|Tsygankov, Petr
Barragan, Yerson
Parada, Fredy
Paez, Carlos
Orozco, Eduardo

Tipo de recurso:: Article of journal

Fecha de publicación:: 2025

Institución:: Universidad Pedagógica y Tecnológica de Colombia

Repositorio:: RiUPTC: Repositorio Institucional UPTC

Idioma:: spa

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dc.title.es-ES.fl_str_mv	Simulación de un plasma de hidrógeno en un reactor de microondas TM112 para la deposición de diamante
title	Simulación de un plasma de hidrógeno en un reactor de microondas TM112 para la deposición de diamante
spellingShingle	Simulación de un plasma de hidrógeno en un reactor de microondas TM112 para la deposición de diamante reactor de plasma microondas simulación computacional películas delgadas deposición química de vapor. plasma reactor microwave, simulation, thin films chemical vapor deposition.
title_short	Simulación de un plasma de hidrógeno en un reactor de microondas TM112 para la deposición de diamante
title_full	Simulación de un plasma de hidrógeno en un reactor de microondas TM112 para la deposición de diamante
title_fullStr	Simulación de un plasma de hidrógeno en un reactor de microondas TM112 para la deposición de diamante
title_full_unstemmed	Simulación de un plasma de hidrógeno en un reactor de microondas TM112 para la deposición de diamante
title_sort	Simulación de un plasma de hidrógeno en un reactor de microondas TM112 para la deposición de diamante
dc.creator.fl_str_mv	Martinez, Alejandro\|Tsygankov, Petr Barragan, Yerson Parada, Fredy Paez, Carlos Orozco, Eduardo
dc.contributor.author.spa.fl_str_mv	Martinez, Alejandro\|Tsygankov, Petr Barragan, Yerson Parada, Fredy Paez, Carlos Orozco, Eduardo
dc.subject.none.fl_str_mv	reactor de plasma microondas simulación computacional películas delgadas deposición química de vapor. plasma reactor microwave, simulation, thin films chemical vapor deposition.
topic	reactor de plasma microondas simulación computacional películas delgadas deposición química de vapor. plasma reactor microwave, simulation, thin films chemical vapor deposition.
publishDate	2025
dc.date.accessioned.none.fl_str_mv	2025-07-25 00:00:00
dc.date.available.none.fl_str_mv	2025-07-25 00:00:00
dc.date.issued.none.fl_str_mv	2025-07-25
dc.type.spa.fl_str_mv	Artículo de revista
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dc.type.local.eng.fl_str_mv	Journal article
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dc.identifier.issn.none.fl_str_mv	0121-7488
dc.identifier.doi.none.fl_str_mv	10.19053/uptc.01217488.v16.n2.2025.18688
dc.identifier.eissn.none.fl_str_mv	2462-7658
dc.identifier.url.none.fl_str_mv	https://doi.org/10.19053/uptc.01217488.v16.n2.2025.18688
identifier_str_mv	0121-7488 10.19053/uptc.01217488.v16.n2.2025.18688 2462-7658
url	https://doi.org/10.19053/uptc.01217488.v16.n2.2025.18688
dc.language.iso.spa.fl_str_mv	spa
language	spa
dc.relation.references.spa.fl_str_mv	K.K. Chattopadhyay, P. Mitra, S. Chaudhuri, A.K. Pal, “Grain boundary barrier height in polycrystalline diamond films produced by DC plasma deposition of CO2 and hydrogen”, Materials Letters., vol. 18, pp. 313-317, 1994 Zhitomirsky. L. Gal-or, A. Khan, M.D. Spang, “Electrolytic PZT films”, J. Mater. Sci, vol. 32, pp. 803-807, 1997. V Fleury, “Branched fractal patterns in nonequilibrium electrochemical deposition from oscillatory nucleation and growth”, Nature, vol. 390, pp. 145-148, 1997. Abdul Wasy Zia, Martin Birkett. “Deposition of diamondlike carbon coatings: Conventional to non-conventional approaches for emerging markets”, International Journal of Refractory Metals & Hards, vol. 78, pp. 107-122, 2019. Ankit Tyagi et al J.“A critical review of diamond like carbon coating for wear resistance Applications”, Nuclear Instruments and Methods in Physics Research, vol. 222, pp. 242-248, 2004. Nicolas Martin. Jean-Marc Cote, Joseph Gavoille, Jean-Yves Rauch.“Titanium oxynitride thin films by the reactive sputtering process with an independent pulsing of O2 andN2 gases”. Thin Solid Films, vol. 796, pp. 140340, 2024. Nosheen Farooq et al, “Recent trends of titania (TiO 2 ) based materials: A review on synthetic approaches and potential applications.”. Journal of King Saud University-Science, vol. 36, pp. 103210, 2024. Priscilla Brosler, Rui F. Silva, Joao Tedim, Filipe J. Oliveira, “Electroconductive silicon nitride-titanium nitrideceramic substrates for CVD diamond electrode deposition.”. Ceramics International vol. 49, pp. 36436-36445, 2024. Duy Phong Pham et al, “In-situ PECVD-based stoichiometric SiO2 layer for semiconductor devices.”.Optical Materials. vol. 137, pp. 113536. 2023. J.J. et al, “A novel microwave plasma reactor with a unique structure for chemical vapor deposition of diamond films.”.Diamond and Related Materials. vol. 42, pp. 28-32, 2014. E.E. Ashkinazi, et al, “Effect of Crystal Structure on the Tribological Properties of Diamond Coatings on Hard- Alloy Cutting Tools”. Journal of Friction and Wear. vol. 38, pp. 252-258, 2017. N Derkaoui et al, “Determining electron temperature and electron density in moderate pressure H2/CH4 microwave plasma.”.Journal of Physics D: Applied Physics. vol. 470, pp. 205201, 2014. AV Khomich , et al“International Conference on Mechanical, System and Control Engineering (ICMSC).”.IEEE pp. 11-15, 2017. pp. 11-15, 2017. M.Y. Chernykh, et al “GaN-based heterostructures with CVD diamond heat sinks: A new fabrication approach towards efficient electronic devices.”.Appl. Mater. Today. vol. 26, pp. 101338, 2022. F Silva et al, “Microwave engineering of plasma-assisted CVD reactors for diamond deposition .”.Condens. Mattel vol. 21, pp. 3642026, 2009. E. A. Orozco, et al“Computational study of a microwave plasma reactor based on the TM112 mode for diamond deposition.”.Applied Physics A. vol. 129, pp. 842, 2023. M Funer, C Wild, P Koidl, “Simulation and development of optimized microwave plasma reactors for diamond deposition.”. Surface and Coatings Technology. vol. 116, pp.853-862, 1999. J.-S. Yoon , et al “Cross Sections for Electron Collisions with Hydrogen Molecules.”.J. Phys. Chem. Ref. Dat. vol. 37, pp. 913-931, 2008. Plasma Data Exchange Project, https://nl.lxcat.net/home/
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dc.relation.citationstartpage.none.fl_str_mv	107
dc.relation.citationvolume.spa.fl_str_mv	16
dc.relation.ispartofjournal.spa.fl_str_mv	Ciencia en Desarrollo
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dc.relation.citationedition.spa.fl_str_mv	Núm. 2 , Año 2025 : Vol. 16 Núm. 2 (2025): Vol. 16 Núm. 2 (2025): Vol 16, Núm.2 (2025): Julio-Diciembre
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dc.publisher.spa.fl_str_mv	Universidad Pedagógica y Tecnológica de Colombia
dc.source.spa.fl_str_mv	https://revistas.uptc.edu.co/index.php/ciencia_en_desarrollo/article/view/18688
institution	Universidad Pedagógica y Tecnológica de Colombia
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spelling	Martinez, Alejandro\|Tsygankov, PetrBarragan, YersonParada, FredyPaez, CarlosOrozco, Eduardo2025-07-25 00:00:002025-07-25 00:00:002025-07-250121-748810.19053/uptc.01217488.v16.n2.2025.186882462-7658https://doi.org/10.19053/uptc.01217488.v16.n2.2025.18688application/pdfspaUniversidad Pedagógica y Tecnológica de Colombiahttps://creativecommons.org/licenses/by-nc-nd/4.0/deed.esinfo:eu-repo/semantics/openAccessEsta obra está bajo una licencia internacional Creative Commons Atribución-NoComercial-SinDerivadas 4.0.http://purl.org/coar/access_right/c_abf2https://revistas.uptc.edu.co/index.php/ciencia_en_desarrollo/article/view/18688reactor de plasmamicroondassimulación computacionalpelículas delgadasdeposición química de vapor.plasma reactormicrowave,simulation,thin filmschemical vapor deposition.Simulación de un plasma de hidrógeno en un reactor de microondas TM112 para la deposición de diamanteArtículo de revistahttp://purl.org/coar/resource_type/c_6501http://purl.org/coar/resource_type/c_2df8fbb1info:eu-repo/semantics/articleJournal articleinfo:eu-repo/semantics/publishedVersionTexthttp://purl.org/coar/version/c_970fb48d4fbd8a85K.K. Chattopadhyay, P. Mitra, S. Chaudhuri, A.K. Pal, “Grain boundary barrier height in polycrystalline diamond films produced by DC plasma deposition of CO2 and hydrogen”, Materials Letters., vol. 18, pp. 313-317, 1994Zhitomirsky. L. Gal-or, A. Khan, M.D. Spang, “Electrolytic PZT films”, J. Mater. Sci, vol. 32, pp. 803-807, 1997.V Fleury, “Branched fractal patterns in nonequilibrium electrochemical deposition from oscillatory nucleation and growth”, Nature, vol. 390, pp. 145-148, 1997.Abdul Wasy Zia, Martin Birkett. “Deposition of diamondlike carbon coatings: Conventional to non-conventional approaches for emerging markets”, International Journal of Refractory Metals & Hards, vol. 78, pp. 107-122, 2019.Ankit Tyagi et al J.“A critical review of diamond like carbon coating for wear resistance Applications”, Nuclear Instruments and Methods in Physics Research, vol. 222, pp. 242-248, 2004.Nicolas Martin. Jean-Marc Cote, Joseph Gavoille, Jean-Yves Rauch.“Titanium oxynitride thin films by the reactive sputtering process with an independent pulsing of O2 andN2 gases”. Thin Solid Films, vol. 796, pp. 140340, 2024.Nosheen Farooq et al, “Recent trends of titania (TiO 2 ) based materials: A review on synthetic approaches and potential applications.”. Journal of King Saud University-Science, vol. 36, pp. 103210, 2024.Priscilla Brosler, Rui F. Silva, Joao Tedim, Filipe J. Oliveira, “Electroconductive silicon nitride-titanium nitrideceramic substrates for CVD diamond electrode deposition.”. Ceramics International vol. 49, pp. 36436-36445, 2024.Duy Phong Pham et al, “In-situ PECVD-based stoichiometric SiO2 layer for semiconductor devices.”.Optical Materials. vol. 137, pp. 113536. 2023.J.J. et al, “A novel microwave plasma reactor with a unique structure for chemical vapor deposition of diamond films.”.Diamond and Related Materials. vol. 42, pp. 28-32, 2014.E.E. Ashkinazi, et al, “Effect of Crystal Structure on the Tribological Properties of Diamond Coatings on Hard- Alloy Cutting Tools”. Journal of Friction and Wear. vol. 38, pp. 252-258, 2017.N Derkaoui et al, “Determining electron temperature and electron density in moderate pressure H2/CH4 microwave plasma.”.Journal of Physics D: Applied Physics. vol. 470, pp. 205201, 2014.AV Khomich , et al“International Conference on Mechanical, System and Control Engineering (ICMSC).”.IEEE pp. 11-15, 2017. pp. 11-15, 2017.M.Y. Chernykh, et al “GaN-based heterostructures with CVD diamond heat sinks: A new fabrication approach towards efficient electronic devices.”.Appl. Mater. Today. vol. 26, pp. 101338, 2022.F Silva et al, “Microwave engineering of plasma-assisted CVD reactors for diamond deposition .”.Condens. Mattel vol. 21, pp. 3642026, 2009.E. A. Orozco, et al“Computational study of a microwave plasma reactor based on the TM112 mode for diamond deposition.”.Applied Physics A. vol. 129, pp. 842, 2023.M Funer, C Wild, P Koidl, “Simulation and development of optimized microwave plasma reactors for diamond deposition.”. Surface and Coatings Technology. vol. 116, pp.853-862, 1999.J.-S. Yoon , et al “Cross Sections for Electron Collisions with Hydrogen Molecules.”.J. Phys. Chem. Ref. Dat. vol. 37, pp. 913-931, 2008.Plasma Data Exchange Project, https://nl.lxcat.net/home/113210716Ciencia en Desarrollohttps://revistas.uptc.edu.co/index.php/ciencia_en_desarrollo/article/download/18688/16591Núm. 2 , Año 2025 : Vol. 16 Núm. 2 (2025): Vol. 16 Núm. 2 (2025): Vol 16, Núm.2 (2025): Julio-DiciembrePublicationOREORE.xmltext/xml2876https://repositorio.uptc.edu.co/bitstreams/8969d131-f84e-412e-8bc7-812763b9fbfd/downloadb16a34644a94712580af65e80e5a1ad9MD51falseAnonymousREAD001/18803oai:repositorio.uptc.edu.co:001/188032026-10-30 07:03:22.953https://creativecommons.org/licenses/by-nc-nd/4.0/deed.esmetadata.onlyhttps://repositorio.uptc.edu.coRepositorio Institucional UPTCbdigital@metabiblioteca.com

Simulación de un plasma de hidrógeno en un reactor de microondas TM112 para la deposición de diamante

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