Plasma diagnostic and microstructural study of WCN coatings growth by pulsed vacuum arc discharge

In this work, we present a study of the plasma evolution during tungsten carbon nitride (WCN) coatings production using the repetitive pulsed arc technique. For the coatings production, a tungsten carbide (WC) target, and a mixture of argon and nitrogen as the filled gas were used. The study was car...

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2018
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Universidad de Medellín
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eng
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id REPOUDEM2_25ab1684ff7ffc92b83bb9703e6fd329
oai_identifier_str oai:repository.udem.edu.co:11407/6158
network_acronym_str REPOUDEM2
network_name_str Repositorio UDEM
repository_id_str
dc.title.none.fl_str_mv Plasma diagnostic and microstructural study of WCN coatings growth by pulsed vacuum arc discharge
title Plasma diagnostic and microstructural study of WCN coatings growth by pulsed vacuum arc discharge
spellingShingle Plasma diagnostic and microstructural study of WCN coatings growth by pulsed vacuum arc discharge
title_short Plasma diagnostic and microstructural study of WCN coatings growth by pulsed vacuum arc discharge
title_full Plasma diagnostic and microstructural study of WCN coatings growth by pulsed vacuum arc discharge
title_fullStr Plasma diagnostic and microstructural study of WCN coatings growth by pulsed vacuum arc discharge
title_full_unstemmed Plasma diagnostic and microstructural study of WCN coatings growth by pulsed vacuum arc discharge
title_sort Plasma diagnostic and microstructural study of WCN coatings growth by pulsed vacuum arc discharge
description In this work, we present a study of the plasma evolution during tungsten carbon nitride (WCN) coatings production using the repetitive pulsed arc technique. For the coatings production, a tungsten carbide (WC) target, and a mixture of argon and nitrogen as the filled gas were used. The study was carried out for discharges generated with one, two, three, and four pulses. The WCN coatings were characterized by X-ray diffraction (XRD) to identify the phases present in this material. The plasma was experimentally studied by optical emission spectroscopy (OES). A correlation was found between the spectral lines behavior and the material composition evolution. As the number of pulses increased, the intensity of the spectral lines also increased, especially in the case of the atomic lines of nitrogen, NI. The results were analysed to obtain information regarding the reactions in the plasma, as well as the electron temperature and density. © 2018 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
publishDate 2018
dc.date.accessioned.none.fl_str_mv 2021-02-05T15:00:14Z
dc.date.available.none.fl_str_mv 2021-02-05T15:00:14Z
dc.date.none.fl_str_mv 2018
dc.type.eng.fl_str_mv Article
dc.type.coarversion.fl_str_mv http://purl.org/coar/version/c_970fb48d4fbd8a85
dc.type.coar.fl_str_mv http://purl.org/coar/resource_type/c_6501
http://purl.org/coar/resource_type/c_2df8fbb1
dc.type.driver.none.fl_str_mv info:eu-repo/semantics/article
dc.identifier.issn.none.fl_str_mv 8631042
dc.identifier.uri.none.fl_str_mv http://hdl.handle.net/11407/6158
dc.identifier.doi.none.fl_str_mv 10.1002/ctpp.201600062
identifier_str_mv 8631042
10.1002/ctpp.201600062
url http://hdl.handle.net/11407/6158
dc.language.iso.none.fl_str_mv eng
language eng
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dc.relation.citationvolume.none.fl_str_mv 58
dc.relation.citationissue.none.fl_str_mv 9
dc.relation.citationstartpage.none.fl_str_mv 827
dc.relation.citationendpage.none.fl_str_mv 837
dc.relation.references.none.fl_str_mv Reniers, F., Hubin, A., Terryn, H., Vereecken, J., (1994) Surf. Interf. Anal., 21, p. 483
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Ospina, R., Escobar, D., Restrepo-Parra, E., Arango, P., Jurado, J., (2013) Tribol. Int., 62, p. 129
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Ehiasarian, A., New, R., Munz, W., Hultman, L., Helmersson, U., Kouznetsovc, V., (2002) Vacuum, 65, p. 147
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Stavropoulos, P., Palagas, C., Angelopolos, G.N., Papamantellos, D.N., Couris, S., (2004) Spectrochim. Acta B, 59, p. 1885
Drogoff, B.L., Margot, J., Chaker, M., Sabsabi, M., Barthelemy, O., Johnston, T., Laville, S., Kaenel, Y.V., (2001) Spectrochim. Acta B, 56, p. 987
Jin, F., Zeng, J., Yuan, J., (2008) J. Quant. Spectrosc., 109, p. 2707
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Ospina-Ospina, R., Jurado, J., Velez, J., Arango, P., Salazar-Enríquez, C., Restrepo-Parra, E., (2010) Surf. Coat. Technol., 205, p. 2191
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Moore, J., Feng, H.J., (1995) Prog. Mater. Sci., 39, p. 243
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dc.rights.coar.fl_str_mv http://purl.org/coar/access_right/c_16ec
rights_invalid_str_mv http://purl.org/coar/access_right/c_16ec
dc.publisher.none.fl_str_mv Wiley-VCH Verlag
dc.publisher.faculty.spa.fl_str_mv Facultad de Ciencias Básicas
publisher.none.fl_str_mv Wiley-VCH Verlag
dc.source.none.fl_str_mv Contributions to Plasma Physics
institution Universidad de Medellín
repository.name.fl_str_mv Repositorio Institucional Universidad de Medellin
repository.mail.fl_str_mv repositorio@udem.edu.co
_version_ 1808481182295261184
spelling 20182021-02-05T15:00:14Z2021-02-05T15:00:14Z8631042http://hdl.handle.net/11407/615810.1002/ctpp.201600062In this work, we present a study of the plasma evolution during tungsten carbon nitride (WCN) coatings production using the repetitive pulsed arc technique. For the coatings production, a tungsten carbide (WC) target, and a mixture of argon and nitrogen as the filled gas were used. The study was carried out for discharges generated with one, two, three, and four pulses. The WCN coatings were characterized by X-ray diffraction (XRD) to identify the phases present in this material. The plasma was experimentally studied by optical emission spectroscopy (OES). A correlation was found between the spectral lines behavior and the material composition evolution. As the number of pulses increased, the intensity of the spectral lines also increased, especially in the case of the atomic lines of nitrogen, NI. The results were analysed to obtain information regarding the reactions in the plasma, as well as the electron temperature and density. © 2018 WILEY-VCH Verlag GmbH & Co. KGaA, WeinheimengWiley-VCH VerlagFacultad de Ciencias Básicashttps://www.scopus.com/inward/record.uri?eid=2-s2.0-85054655124&doi=10.1002%2fctpp.201600062&partnerID=40&md5=3d78a5a6fbcb15533931f94251f8d14c589827837Reniers, F., Hubin, A., Terryn, H., Vereecken, J., (1994) Surf. Interf. Anal., 21, p. 483Lunk, A., (1991) Contrib. Plasma Phys., 31, p. 231Polcar, T., Parreira, N.M.G., Cavaleiro, A., (2007) Wear, 262, p. 655Colorado, H.A., Salva, H.R., Ghilarducci, A.A., (2009) DYNA, 76, p. 207Ospina, R., Escobar, D., Restrepo-Parra, E., Arango, P., Jurado, J., (2013) Tribol. Int., 62, p. 129Ospina, R., Escobar-Rincon, D., Arango, P., Restrepo-Parra, E., Jurado, J., (2013) Surf. Coat. Technol., 232, p. 96Kudrna, A.K.P., Tichy, M., (2011), WDS'11 Proc. Contributed Papers, Part II,, 180–185Pedersen, G., Jensen, H., Sorensen, G., (1993) Surf. Coat. Technol., 59, p. 110Corbella, C., Rubio-Roy, M., Bertran, E., Andujar, J.L., (2009) J. Appl. Phys., 106, p. 33302Maslani, A., Sember, V., Hrabovsky, M., (2017) Spectrochim. Acta Part B At. Spectrosc., 133, p. 14Salhi, M., Abaidia, S., Mammeri, S., Bouaouina, B., (2017) Thin Solid Films, 629, p. 22Chou, C., Chuang, C., Lin, C., Chung, C., He, J., (2011) Surf. Coat. Technol., 205, p. 4880Bobzin, K., Broegelmann, T., Kruppe, N., Engels, M., (2017) Surf. Coat. Technol., 332, p. 2. , Article in pressPat, S., Ekem, N., Akan, T., Kusmü, O., Demirkol, S., Vladoiu, R., Lungu, C.P., Musa, G., (2005) J. Optoelectron. Adv. Mater., 7, p. 2495Zhao, Q.X., Bian, F., Zhou, Y., Gao, Y.F., Wang, S.B., Ma, L., Yan, Z., Liu, B.T., (2008) Mater. Lett., 62, p. 4140Chang, Y., Yang, S.J., Liu, Y.H., Wang, D., (2008) Thin Solid Films, 516, p. 5536Suraj, K.S., Bharathi, P., Prahlad, V., Mukherjee, S., (2007) Surf. Coat. Technol., 207, p. 301Romero, J., Lousa, A., (2007) Vacuum, 81, p. 1421Andujar, J.L., Pascual, E., Viera, G., Bertran, E., (1998) Thin Solid Films, 317, p. 120Ehiasarian, A., New, R., Munz, W., Hultman, L., Helmersson, U., Kouznetsovc, V., (2002) Vacuum, 65, p. 147Mallik, A., Bysakh, S., Dutta, S., Basu, D., (2014) Sadhana, 39, p. 957Saikia, P., Saikia, B., Bhuyan, H., (2016) AIP Adv., 6, p. 45206Shiao, M.H., Shieu, F.S., (2001) Thin Solid Films, 386, p. 27Sanders, D.M., Boercker, D.B., Falabella, S., (1990) IEEE Trans. Plasma Sci., 18, p. 883Bruzzone, H., Kelly, H., Marquez, A., Lamas, D., Ansaldi, A., Oviedo, C., (1996) Plasma Source Sci. Technol., 5, p. 582Ma, J., Ashfold, M., Mankelevich, Y., (2009) J. Appl. Phys., 105, p. 43302Gulas, M., Normand, F.L., Veis, P., (2009) Appl. Surf. Sci., 255, p. 5177Konstantinidis, S., Gaboriau, F., Gaillard, M., Hecq, M., Ricard, A., (2008) Optical Plasma Diagnostics During Reactive Magnetron Sputtering, p. 301. , Springer Series in Materials Science, (Eds, D. Depla, S. Mahieu,) Springer-Verlag Berlin Heidelberg,), Ch. 9, pMehdi, T., Legrand, P., Dauchot, J., Wautelet, M., Hecq, M., (1993) Spectrochim. Acta Part B: At. Spectrosc, 48, p. 1023Restrepo, E., Devia, A., (2004) J. Vacuum Sci. Technol. A, 22, p. 377Restrepo-Parra, E., Moreno-Montoya, L.E., Arango, P.A., (2009) Surf. Coat. Technol., 204, p. 271Garca, L.A., Restrepo, E., Jimenez, H., Castillo, H., Ospina, R., Benavides, V., Devia, A., (2006) Vacuum, 81, p. 411Larijani, M., Normand, F.L., Cregut, O., (2007) Appl. Surf. Sci., 253, p. 4051Shukla, G., Khare, A., (2009) Appl. Surf. Sci., 255, p. 8730Frugier, P., Girold, C., Megy, S., Vandensteendam, C., Ershov-Pavlov, E.A., Baronne, J.M., (2000) Plasma Chem. Plasma Proc., 20, p. 65Albinski, K., Musiol, K., Miernikiewicz, A., Labuz, S., Malota, M., (1996) Plasma Sources Sci. Technol., 5, p. 736Aguilera, J.A., Aragon, C., (2004) Spectrochim. Acta B, 59, p. 1861Stavropoulos, P., Palagas, C., Angelopolos, G.N., Papamantellos, D.N., Couris, S., (2004) Spectrochim. Acta B, 59, p. 1885Drogoff, B.L., Margot, J., Chaker, M., Sabsabi, M., Barthelemy, O., Johnston, T., Laville, S., Kaenel, Y.V., (2001) Spectrochim. Acta B, 56, p. 987Jin, F., Zeng, J., Yuan, J., (2008) J. Quant. Spectrosc., 109, p. 2707Garc'ıa, L.A., Pulzara, A.O., Devia, A., Restrepo, E., (2005) J. Vac. Sci. Technol. A, 23, p. 551Sola, A., Calzada, M.D., Gamero, A., (1995) J. Phys. D: Appl. Phys., 28, p. 1099Ivkovic, M., Jovicevic, S., Konjevic, N., (2004) Spectrochim. Acta B, 59, p. 591Ospina-Ospina, R., Jurado, J., Velez, J., Arango, P., Salazar-Enríquez, C., Restrepo-Parra, E., (2010) Surf. Coat. Technol., 205, p. 2191Su, Y.D., Hu, C.Q., Wen, M., Wang, C., Liu, D.S., Zheng, W.T., (2009) J. Alloy Compd., 486, p. 357Moore, J., Feng, H.J., (1995) Prog. Mater. Sci., 39, p. 243(2014), http://www.nist.gov/pml/data/asd.cfm, accessed: NovemberValledor, R., Pisonero, J., Nelis, T., Bordel, N., (2012) Spectrochim. Acta B, 68, p. 2433Belenguer, P., Ganciu, M., Guillot, P., Nelis, T., (2009) Spectrochim. Acta B, 64, p. 623Gaydon, A., (1976) The Identification of Molecular Spectra, , Springer, NetherlandsKelly, H., Lepone, A., Minotti, F., (2000) J. Appl. Phys., 87, p. 8316Vetter, J., Knotek, O., Brand, J., Beele, W., (1994) Sur. Coat. Technol., 68-69, p. 27Sickafoose, S., Smith, A., Morse, M., (2002) J. Chem. Phys., 116 (3), p. 993Xin, H.W., Tian, L.H., Panb, J.D., He, Q., Xu, Z., Zhang, Z.M., (2000) Surf. Coat. Technol., 131, p. 167Lien, S.Y., Chang, Y.Y., Cho, Y.S., Wang, J.H., Weng, K.W., Chao, C.H., Chen, C.F., (2011) J. Non-Cryst. Solids, 357, p. 161Wagatsuma, K., (2001) Spectrochim. Acta B, 56, p. 465Wagatsuma, K., Hirokawa, K., (1985) Anal. Chem., 57, p. 2901Jackson, G.P., King, F.L., (2003) Spectrochim. Acta B, 58, p. 185Wronski, Z., (2005) Vacuum, 78, p. 641Fishburne, E.S., (1967) J. Chem. Phys., 47, p. 58Itikawa, Y., Hayashi, M., Ichimura, A., (1986) J. Phys. Chem. Ref. Data, 15, p. 985Kim, Y.K., Baek, J.M., Lee, K.H., (2001) Surf. Coat. Technol., 142-144, p. 321Colli, L., Facchini, U., (1952) Rev. Sci. Instrum., 23, p. 39Nielsen, R.A., (1936) Phys. Rev., 50, p. 950Renevier, N., Czerwiec, T., Collignon, P., Michel, H., (1998) Surf. Coat. Technol., 98, p. 1400Sansonettia, J.E., Martin, W.C., (2005) J. Phys. Chem. Ref. Data, 34, p. 20899Restrepo-Parra, E., Riaño-Rojas, J.C., Serna-Morales, A.F., Cárdenas-Peña, D., Prieto-Ortiz, F.A., (2009) Dyna, 76, p. 205Remy, J., Biennier, L., Salama, F., (2003) Plasma Sources Sci. Technol., 12, p. 295Barker, P., Konstantinidis, S., Lewina, E., Britun, N., Patscheider, J., (2014) Surf. Coat. Technol., 258, p. 631Nemcova, A., Skeldon, P., Thompson, G., Pacal, B., (2013) Surf. Coat. Technol., 232, p. 827Liu, R., Weng, N., Xue, W., Hua, M., Liu, G., Li, W., (2015) Surf. Coat. Technol., 269, p. 212Tendero, C., Tixier, C., Tristant, P., Desmaison, J., Leprince, P., (2006) Spectrochim. Acta B, 61, p. 230Contributions to Plasma PhysicsPlasma diagnostic and microstructural study of WCN coatings growth by pulsed vacuum arc dischargeArticleinfo:eu-repo/semantics/articlehttp://purl.org/coar/version/c_970fb48d4fbd8a85http://purl.org/coar/resource_type/c_6501http://purl.org/coar/resource_type/c_2df8fbb1Restrepo-Parra, E., Laboratorio de Física del Plasma, Universidad Nacional de Colombia - Sede Manizales, Manizales, ColombiaEscobar, D., Laboratorio de Física del Plasma, Universidad Nacional de Colombia - Sede Manizales, Manizales, Colombia, Grupo de Magnetismo y Simulación, Instituto de Física, Universidad de Antioquia, Medellín, ColombiaOspina, R., Laboratorio de Física del Plasma, Universidad Nacional de Colombia - Sede Manizales, Manizales, Colombia, Universidad Industrial de Santander, Bucaramanga, ColombiaQuintero, J.H., Materiales Nanoestructurados y Biomodelación MATBIOM, Universidad de Medellín, Medellín, ColombiaLondoño, R.M., Laboratorio de Física del Plasma, Universidad Nacional de Colombia - Sede Manizales, Manizales, Colombiahttp://purl.org/coar/access_right/c_16ecRestrepo-Parra E.Escobar D.Ospina R.Quintero J.H.Londoño R.M.11407/6158oai:repository.udem.edu.co:11407/61582021-02-05 10:00:14.914Repositorio Institucional Universidad de Medellinrepositorio@udem.edu.co

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