Macroporous silicon: efficient antireflective layer on crystalline silicon

A macroporous silicon layer (ma-PS) electrochemically grown on crystalline silicon surface can be used as an efficient antireflective layer in optical devices as antireflection coating. In this work, we presented the ma-PS layers fabricated on crystalline silicon (c-Si) n-type and p +-type, obtained...

Full description

Autores:
Fonthal Rico, Faruk
Torres Chávez, Ivaldo
Rodríguez, Ángel
Tipo de recurso:
Article of journal
Fecha de publicación:
2011
Institución:
Universidad Autónoma de Occidente
Repositorio:
RED: Repositorio Educativo Digital UAO
Idioma:
eng
OAI Identifier:
oai:red.uao.edu.co:10614/11902
Acceso en línea:
http://red.uao.edu.co//handle/10614/11902
https://www.researchgate.net/publication/242206332_Macroporous_silicon_Efficient_antireflective_layer_on_crystalline_silicon
Palabra clave:
Porous silicon
Crystalline silicon
Electrochemical etching
Antireflective coating
Etching time
Rights
openAccess
License
Derechos Reservados - Universidad Autónoma de Occidente
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dc.title.eng.fl_str_mv Macroporous silicon: efficient antireflective layer on crystalline silicon
title Macroporous silicon: efficient antireflective layer on crystalline silicon
spellingShingle Macroporous silicon: efficient antireflective layer on crystalline silicon
Porous silicon
Crystalline silicon
Electrochemical etching
Antireflective coating
Etching time
title_short Macroporous silicon: efficient antireflective layer on crystalline silicon
title_full Macroporous silicon: efficient antireflective layer on crystalline silicon
title_fullStr Macroporous silicon: efficient antireflective layer on crystalline silicon
title_full_unstemmed Macroporous silicon: efficient antireflective layer on crystalline silicon
title_sort Macroporous silicon: efficient antireflective layer on crystalline silicon
dc.creator.fl_str_mv Fonthal Rico, Faruk
Torres Chávez, Ivaldo
Rodríguez, Ángel
dc.contributor.author.none.fl_str_mv Fonthal Rico, Faruk
dc.contributor.author.spa.fl_str_mv Torres Chávez, Ivaldo
Rodríguez, Ángel
dc.subject.eng.fl_str_mv Porous silicon
Crystalline silicon
Electrochemical etching
Antireflective coating
topic Porous silicon
Crystalline silicon
Electrochemical etching
Antireflective coating
Etching time
dc.subject.spa.fl_str_mv Etching time
description A macroporous silicon layer (ma-PS) electrochemically grown on crystalline silicon surface can be used as an efficient antireflective layer in optical devices as antireflection coating. In this work, we presented the ma-PS layers fabricated on crystalline silicon (c-Si) n-type and p +-type, obtained by electrochemical etching. The morphology, porosity, thickness of ma-PS layer can be adjusted by controlling the electrochemical formation conditions. The optical behaviour of the antireflective coating over the solar spectrum is determined, resulting in very low values of the normalized reflectivity coefficient (below ~1%). The reflectivity measurements were evaluated at 45° in the different samples of the ma-PS/c-Si
publishDate 2011
dc.date.issued.spa.fl_str_mv 2011-07
dc.date.accessioned.spa.fl_str_mv 2020-02-14T20:32:52Z
dc.date.available.spa.fl_str_mv 2020-02-14T20:32:52Z
dc.type.spa.fl_str_mv Artículo de revista
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dc.identifier.citation.eng.fl_str_mv Fonthal Rico, Faruk; Torres Chávez, Ivaldo; Rodriguez, Angel. Macroporous silicon: efficient antireflective layer on crystalline silicon. En: Journal of Materials Science: Materials in Electronics. Volumen 22, número 7, (julio 2011); páginas 895-900
dc.identifier.issn.spa.fl_str_mv 0957-4522
dc.identifier.uri.eng.fl_str_mv http://red.uao.edu.co//handle/10614/11902
https://www.researchgate.net/publication/242206332_Macroporous_silicon_Efficient_antireflective_layer_on_crystalline_silicon
dc.identifier.doi.eng.fl_str_mv doi10.1007/s10854-010-0232-6
identifier_str_mv Fonthal Rico, Faruk; Torres Chávez, Ivaldo; Rodriguez, Angel. Macroporous silicon: efficient antireflective layer on crystalline silicon. En: Journal of Materials Science: Materials in Electronics. Volumen 22, número 7, (julio 2011); páginas 895-900
0957-4522
doi10.1007/s10854-010-0232-6
url http://red.uao.edu.co//handle/10614/11902
https://www.researchgate.net/publication/242206332_Macroporous_silicon_Efficient_antireflective_layer_on_crystalline_silicon
dc.language.iso.eng.fl_str_mv eng
language eng
dc.relation.eng.fl_str_mv Journal of Materials Science: Materials in Electronics. Volumen 22, número 7, (julio 2011); páginas 895-900
dc.relation.references.eng.fl_str_mv A. Prasad, S. Balakrishnan, S.K. Jain, G.C. Jain, J. Electrochem.Soc. 129, 596 (1982).
L.T. Canham, Appl. Phys. Lett. 57, 1046 (1990.
S. Yae et al., Solar Ener. 80, 701 (2006).
B. Gonza´lez-Dı´az et al., Physica E 38, 215 (2007).
T.D. James et al., in International Conferrence on Nanoscience and Nanotechnology, (ICONN 2006, Brisbane, Australia, 2006.
M.J. Huang, C.R. Yang, Y.C. Chiou, R.T. Lee, Solar Ener. Mat.Solar Cell 92, 13526 (2008).
N. Marrero, R. Guerrero-Lemus, B. Gonza´lez-Dı´az, D. Borchert,Thin Solid Film 517, 2648 (2009).
A.M. Rossi, H.G. Bohn, Phys. Status Solidi. (a) 202, 1644 (2005).
U. Gangopadhyay et al., Solar Ener. Mat. Solar Cell 91, 285(2007).
F. Fonthal et al., in AIP Conferrence Proceedings VI RIAO/IX OPTILAS. vol. 992, (2008), p. 780.
F. Fonthal, I. Torres, in 11th International Conferences on Advanced Materials, (ICAM 2009, Rio de Janeiro, Brazil 2009).
M.Y. Ghannam, A.A. Abouelsaood, A.S. Alomar, J. Poortmans,Solar Ener. Mat. Solar Cell 94, 850 (2010)
dc.rights.spa.fl_str_mv Derechos Reservados - Universidad Autónoma de Occidente
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spelling Fonthal Rico, Farukvirtual::1754-1Torres Chávez, Ivaldo1a4ce5e9e1238e7f0a7cdc2240db62f5Rodríguez, ÁngelUniversidad Autónoma de Occidente. Calle 25 115-85. Km 2 vía Cali-Jamundí2020-02-14T20:32:52Z2020-02-14T20:32:52Z2011-07Fonthal Rico, Faruk; Torres Chávez, Ivaldo; Rodriguez, Angel. Macroporous silicon: efficient antireflective layer on crystalline silicon. En: Journal of Materials Science: Materials in Electronics. Volumen 22, número 7, (julio 2011); páginas 895-9000957-4522http://red.uao.edu.co//handle/10614/11902https://www.researchgate.net/publication/242206332_Macroporous_silicon_Efficient_antireflective_layer_on_crystalline_silicondoi10.1007/s10854-010-0232-6A macroporous silicon layer (ma-PS) electrochemically grown on crystalline silicon surface can be used as an efficient antireflective layer in optical devices as antireflection coating. In this work, we presented the ma-PS layers fabricated on crystalline silicon (c-Si) n-type and p +-type, obtained by electrochemical etching. The morphology, porosity, thickness of ma-PS layer can be adjusted by controlling the electrochemical formation conditions. The optical behaviour of the antireflective coating over the solar spectrum is determined, resulting in very low values of the normalized reflectivity coefficient (below ~1%). The reflectivity measurements were evaluated at 45° in the different samples of the ma-PS/c-SiUna capa de silicio macroporoso (ma-PS) cultivada electroquímicamente sobre una superficie de silicio cristalino puede usarse como una capa antirreflectante eficaz en dispositivos ópticos como revestimiento antirreflectante. En este trabajo presentamos las capas de ma-PS fabricadas sobre silicio cristalino (c-Si) tipo ny tipo p +, obtenido por grabado electroquímico. La morfología, la porosidad y el grosor de la capa de ma-PS se pueden ajustar controlando las condiciones de formación electroquímica. Se determina el comportamiento óptico del revestimiento antirreflectante sobre el espectro solar, lo que da como resultado valores muy bajos del coeficiente de reflectividad normalizado (por debajo de ~ 1%). Las medidas de reflectividad se evaluaron a 45 ° en las diferentes muestras del ma-PS / c-Si.application/pdf895–900 páginasengJournal of materials science. Materials in electronicsJournal of Materials Science: Materials in Electronics. Volumen 22, número 7, (julio 2011); páginas 895-900A. Prasad, S. Balakrishnan, S.K. Jain, G.C. Jain, J. Electrochem.Soc. 129, 596 (1982).L.T. Canham, Appl. Phys. Lett. 57, 1046 (1990.S. Yae et al., Solar Ener. 80, 701 (2006).B. Gonza´lez-Dı´az et al., Physica E 38, 215 (2007).T.D. James et al., in International Conferrence on Nanoscience and Nanotechnology, (ICONN 2006, Brisbane, Australia, 2006.M.J. Huang, C.R. Yang, Y.C. Chiou, R.T. Lee, Solar Ener. Mat.Solar Cell 92, 13526 (2008).N. Marrero, R. Guerrero-Lemus, B. Gonza´lez-Dı´az, D. Borchert,Thin Solid Film 517, 2648 (2009).A.M. Rossi, H.G. Bohn, Phys. Status Solidi. (a) 202, 1644 (2005).U. Gangopadhyay et al., Solar Ener. Mat. Solar Cell 91, 285(2007).F. Fonthal et al., in AIP Conferrence Proceedings VI RIAO/IX OPTILAS. vol. 992, (2008), p. 780.F. Fonthal, I. Torres, in 11th International Conferences on Advanced Materials, (ICAM 2009, Rio de Janeiro, Brazil 2009).M.Y. Ghannam, A.A. Abouelsaood, A.S. Alomar, J. Poortmans,Solar Ener. Mat. 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