Influence of Si Atoms Insertion on the Formation of the Ti-Si-N Composite by DFT Simulation

Using Density Functional Theory (DFT) SiN and TiN structures were simulated, in order to study the influence of the silicon atoms insertion in the TiN lattice placed on interstitial and substitutional positions in a face centered cubic (FCC) crystalline lattice. Results showed that the SiN - FCC structure is pseudo-stable; meanwhile the tetragonal structure is stable with ceramic behavior. The TiN - FCC structure is stable with ceramic behavior similar to SiN - Tetragonal. 21% silicon atoms insertion in interstitial positions showed high induced deformation, high polarization and Si - N bond formation, indication an amorphous transition that could lead to the production of a material composed from TiN grains or nano-grains embedded in a Si - N amorphous matrix. When including 21% of silicon atoms, substituting titanium atoms, the distribution showed higher stability that could lead to the formation of different phases of the stoichiometric Ti1 -x SixNy compound.

• Autores: Gonzalez, Juan Manuel; Restrepo, Johans Steeven; Ortega Portilla, Carolina; Ruden Muñoz, Alexander; Sequeda Osorio, Federico
• Fecha de publicación: 2016
• Institución: Universidad EAFIT
• Repositorio: Repositorio EAFIT
• Idioma: eng
• OAI Identifier: oai:repository.eafit.edu.co:10784/11281
• Acceso en línea: http://publicaciones.eafit.edu.co/index.php/ingciencia/article/view/3211; http://hdl.handle.net/10784/11281
• Palabra clave: density functional theory; crystalline structure; nano-composite; silicon; thin films; coatings; Teoría de funcionales de densidad; estructura cristalina; silicio; películas delgadas; revestimientos
• License: Copyright (c) 2016 Ingeniería y Ciencia | ing.cienc.