α-MoO3 thin films prepared by spray pyrolysis

In this work thin films of molybdenum trioxide (MoO3) were prepared by the pyrolytic atomization technique. The films were deposited on glass substrates and obtained from a precursor solution of Tetrahydrate Ammonium Heptamolybdate ((NH3) 6Mo7O24.4H2O) 0.1 M. The substrate temperature was kept const...

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Autores:
Martínez, H M
Torres, J
López-Carreño, L D
Alfonso, J E
Moreno, Luis
Pardo, A
Tipo de recurso:
Fecha de publicación:
2011
Institución:
Universidad EAFIT
Repositorio:
Repositorio EAFIT
Idioma:
spa
OAI Identifier:
oai:repository.eafit.edu.co:10784/14466
Acceso en línea:
http://hdl.handle.net/10784/14466
Palabra clave:
Moo3
Pyrolytic Atomization
Co Sensor
Sem
Xrd
Moo3
Atomización Pirolítica
Sensor De Co
Sem
Xrd
Rights
License
Copyright (c) 2011 H M Martínez, J Torres, L D López-Carreño, J E Alfonso, Luis Moreno, A Pardo
Description
Summary:In this work thin films of molybdenum trioxide (MoO3) were prepared by the pyrolytic atomization technique. The films were deposited on glass substrates and obtained from a precursor solution of Tetrahydrate Ammonium Heptamolybdate ((NH3) 6Mo7O24.4H2O) 0.1 M. The substrate temperature was kept constant at 400 oC and the volume of the solution was varied precursor The samples were characterized by X-ray diffraction (XRD), infrared spectroscopy, Scanning Electron Microscopy (SEM) and electrically through measurements of electrical resistivity as a function of temperature. The samples grow with crystalline structure corresponding to the alpha phase of MoO3 with preferential direction of growth along the planes (0k0). As the volume of the precursor solution increases, the surface of the samples becomes porous. The resistivity in these samples changes in an order of magnitude when they are exposed to the atmosphere of CO.