Methods employed in optical emission spectroscopy analysis: a review
In this work, different methods employed for the analysis of emission spectra are presented -- The proposal is to calculate the excitation temperature (Texc), electronic temperature (Te) and electron density (ne) for several plasma techniques used in the growth of thin films -- Some of these techniq...
- Autores:
-
Devia, D. M.
Rodriguez-Restrepo, L. V.
Restrepo-Parra, E.
- Tipo de recurso:
- Fecha de publicación:
- 2014
- Institución:
- Universidad EAFIT
- Repositorio:
- Repositorio EAFIT
- Idioma:
- eng
- OAI Identifier:
- oai:repository.eafit.edu.co:10784/5300
- Acceso en línea:
- http://hdl.handle.net/10784/5300
- Palabra clave:
- ESPECTROSCOPIA DE EMISIÓN
ANÁLISIS ESPECTRAL
ESPECTROSCOPIA DE PLASMA
ANÁLISIS ESPECTRAL
PELÍCULAS DELGADAS
Emission spectroscopy
Spectrum analysis
Plasma spectroscopy
Spectrum analysis
Thin films
- Rights
- License
- Copyright (c) 2015 Ingeniería y Ciencia – ing.cienc.
id |
REPOEAFIT2_15393b48f651f8fea7d8bb6ea2747b64 |
---|---|
oai_identifier_str |
oai:repository.eafit.edu.co:10784/5300 |
network_acronym_str |
REPOEAFIT2 |
network_name_str |
Repositorio EAFIT |
repository_id_str |
|
spelling |
2014-12-192015-05-06T15:16:01Z2014-12-192015-05-06T15:16:01Z1794–9165http://hdl.handle.net/10784/530010.17230/ingciencia.11.21.122256-4314In this work, different methods employed for the analysis of emission spectra are presented -- The proposal is to calculate the excitation temperature (Texc), electronic temperature (Te) and electron density (ne) for several plasma techniques used in the growth of thin films -- Some of these techniques include magnetron sputtering and arc discharges -- Initially, some fundamental physical principles that support the Optical Emission Spectroscopy (OES) technique are described; then, some rules to consider during the spectral analysis to avoid ambiguities are listed -- Finally, some of the more frequently used spectroscopic methods for determining the physical properties of plasma are describedapplication/pdfengUniversidad EAFITIngeniería y Ciencia - ing.cienc.; Vol. 11, Núm. 21 (2015): 10 años; 239-267http://publicaciones.eafit.edu.co/index.php/ingciencia/article/view/2459http://publicaciones.eafit.edu.co/index.php/ingciencia/article/view/2459Copyright (c) 2015 Ingeniería y Ciencia – ing.cienc.http://creativecommons.org/licenses/by/4.0Acceso abiertohttp://purl.org/coar/access_right/c_abf2Ingeniería y Ciencia - ing.cienc.; Vol. 11, Núm. 21 (2015): 10 años; 239-267instname:Universidad EAFITreponame:Repositorio Institucional Universidad EAFITMethods employed in optical emission spectroscopy analysis: a reviewarticleinfo:eu-repo/semantics/articleinfo:eu-repo/semantics/articleArtículohttp://purl.org/coar/version/c_970fb48d4fbd8a85http://purl.org/coar/resource_type/c_6501http://purl.org/coar/resource_type/c_2df8fbb1ESPECTROSCOPIA DE EMISIÓNANÁLISIS ESPECTRALESPECTROSCOPIA DE PLASMAANÁLISIS ESPECTRALPELÍCULAS DELGADASEmission spectroscopySpectrum analysisPlasma spectroscopySpectrum analysisThin filmsDevia, D. M.Rodriguez-Restrepo, L. V.Restrepo-Parra, E.Universidad Nacional de ColombiaIngeniería y Ciencia1121239267ing.cienc.ORIGINAL12.pdf12.pdfTexto completo PDFapplication/pdf966607https://repository.eafit.edu.co/bitstreams/e3109c52-c261-4e8b-b26e-43c4603fcda4/downloadbd04f60e1d4b981213cff20f262ee868MD51articulo.htmlarticulo.htmlTexto completo HTMLtext/html374https://repository.eafit.edu.co/bitstreams/1a846047-60e1-4fec-903a-4bad32b55f03/downloade8d484ac91af0142bf58c1f9435a2e10MD53THUMBNAILminaitura-ig_Mesa de trabajo 1.jpgminaitura-ig_Mesa de trabajo 1.jpgimage/jpeg265796https://repository.eafit.edu.co/bitstreams/8fec0ce2-a4ea-4adf-83c0-ad4e9477471e/downloadda9b21a5c7e00c7f1127cef8e97035e0MD5210784/5300oai:repository.eafit.edu.co:10784/53002020-03-01 23:20:20.677open.accesshttps://repository.eafit.edu.coRepositorio Institucional Universidad EAFITrepositorio@eafit.edu.co |
dc.title.eng.fl_str_mv |
Methods employed in optical emission spectroscopy analysis: a review |
title |
Methods employed in optical emission spectroscopy analysis: a review |
spellingShingle |
Methods employed in optical emission spectroscopy analysis: a review ESPECTROSCOPIA DE EMISIÓN ANÁLISIS ESPECTRAL ESPECTROSCOPIA DE PLASMA ANÁLISIS ESPECTRAL PELÍCULAS DELGADAS Emission spectroscopy Spectrum analysis Plasma spectroscopy Spectrum analysis Thin films |
title_short |
Methods employed in optical emission spectroscopy analysis: a review |
title_full |
Methods employed in optical emission spectroscopy analysis: a review |
title_fullStr |
Methods employed in optical emission spectroscopy analysis: a review |
title_full_unstemmed |
Methods employed in optical emission spectroscopy analysis: a review |
title_sort |
Methods employed in optical emission spectroscopy analysis: a review |
dc.creator.fl_str_mv |
Devia, D. M. Rodriguez-Restrepo, L. V. Restrepo-Parra, E. |
dc.contributor.author.spa.fl_str_mv |
Devia, D. M. Rodriguez-Restrepo, L. V. Restrepo-Parra, E. |
dc.contributor.affiliation.spa.fl_str_mv |
Universidad Nacional de Colombia |
dc.subject.lemb.none.fl_str_mv |
ESPECTROSCOPIA DE EMISIÓN ANÁLISIS ESPECTRAL ESPECTROSCOPIA DE PLASMA ANÁLISIS ESPECTRAL PELÍCULAS DELGADAS |
topic |
ESPECTROSCOPIA DE EMISIÓN ANÁLISIS ESPECTRAL ESPECTROSCOPIA DE PLASMA ANÁLISIS ESPECTRAL PELÍCULAS DELGADAS Emission spectroscopy Spectrum analysis Plasma spectroscopy Spectrum analysis Thin films |
dc.subject.keyword.none.fl_str_mv |
Emission spectroscopy Spectrum analysis Plasma spectroscopy Spectrum analysis Thin films |
description |
In this work, different methods employed for the analysis of emission spectra are presented -- The proposal is to calculate the excitation temperature (Texc), electronic temperature (Te) and electron density (ne) for several plasma techniques used in the growth of thin films -- Some of these techniques include magnetron sputtering and arc discharges -- Initially, some fundamental physical principles that support the Optical Emission Spectroscopy (OES) technique are described; then, some rules to consider during the spectral analysis to avoid ambiguities are listed -- Finally, some of the more frequently used spectroscopic methods for determining the physical properties of plasma are described |
publishDate |
2014 |
dc.date.issued.none.fl_str_mv |
2014-12-19 |
dc.date.available.none.fl_str_mv |
2015-05-06T15:16:01Z |
dc.date.accessioned.none.fl_str_mv |
2015-05-06T15:16:01Z |
dc.date.none.fl_str_mv |
2014-12-19 |
dc.type.eng.fl_str_mv |
article |
dc.type.none.fl_str_mv |
info:eu-repo/semantics/article info:eu-repo/semantics/article |
dc.type.coarversion.fl_str_mv |
http://purl.org/coar/version/c_970fb48d4fbd8a85 |
dc.type.coar.fl_str_mv |
http://purl.org/coar/resource_type/c_6501 http://purl.org/coar/resource_type/c_2df8fbb1 |
dc.type.local.spa.fl_str_mv |
Artículo |
dc.identifier.issn.none.fl_str_mv |
1794–9165 |
dc.identifier.uri.none.fl_str_mv |
http://hdl.handle.net/10784/5300 |
dc.identifier.doi.none.fl_str_mv |
10.17230/ingciencia.11.21.12 |
dc.identifier.eissn.none.fl_str_mv |
2256-4314 |
identifier_str_mv |
1794–9165 10.17230/ingciencia.11.21.12 2256-4314 |
url |
http://hdl.handle.net/10784/5300 |
dc.language.iso.eng.fl_str_mv |
eng |
language |
eng |
dc.relation.ispartof.spa.fl_str_mv |
Ingeniería y Ciencia - ing.cienc.; Vol. 11, Núm. 21 (2015): 10 años; 239-267 |
dc.relation.isversionof.none.fl_str_mv |
http://publicaciones.eafit.edu.co/index.php/ingciencia/article/view/2459 |
dc.relation.uri.none.fl_str_mv |
http://publicaciones.eafit.edu.co/index.php/ingciencia/article/view/2459 |
dc.rights.spa.fl_str_mv |
Copyright (c) 2015 Ingeniería y Ciencia – ing.cienc. http://creativecommons.org/licenses/by/4.0 |
dc.rights.coar.fl_str_mv |
http://purl.org/coar/access_right/c_abf2 |
dc.rights.local.spa.fl_str_mv |
Acceso abierto |
rights_invalid_str_mv |
Copyright (c) 2015 Ingeniería y Ciencia – ing.cienc. http://creativecommons.org/licenses/by/4.0 Acceso abierto http://purl.org/coar/access_right/c_abf2 |
dc.format.none.fl_str_mv |
application/pdf |
dc.publisher.spa.fl_str_mv |
Universidad EAFIT |
dc.source.spa.fl_str_mv |
Ingeniería y Ciencia - ing.cienc.; Vol. 11, Núm. 21 (2015): 10 años; 239-267 instname:Universidad EAFIT reponame:Repositorio Institucional Universidad EAFIT |
instname_str |
Universidad EAFIT |
institution |
Universidad EAFIT |
reponame_str |
Repositorio Institucional Universidad EAFIT |
collection |
Repositorio Institucional Universidad EAFIT |
bitstream.url.fl_str_mv |
https://repository.eafit.edu.co/bitstreams/e3109c52-c261-4e8b-b26e-43c4603fcda4/download https://repository.eafit.edu.co/bitstreams/1a846047-60e1-4fec-903a-4bad32b55f03/download https://repository.eafit.edu.co/bitstreams/8fec0ce2-a4ea-4adf-83c0-ad4e9477471e/download |
bitstream.checksum.fl_str_mv |
bd04f60e1d4b981213cff20f262ee868 e8d484ac91af0142bf58c1f9435a2e10 da9b21a5c7e00c7f1127cef8e97035e0 |
bitstream.checksumAlgorithm.fl_str_mv |
MD5 MD5 MD5 |
repository.name.fl_str_mv |
Repositorio Institucional Universidad EAFIT |
repository.mail.fl_str_mv |
repositorio@eafit.edu.co |
_version_ |
1814110356939735040 |