Methods employed in optical emission spectroscopy analysis: a review

In this work, different methods employed for the analysis of emission spectra are presented -- The proposal is to calculate the excitation temperature (Texc), electronic temperature (Te) and electron density (ne) for several plasma techniques used in the growth of thin films -- Some of these techniques include magnetron sputtering and arc discharges -- Initially, some fundamental physical principles that support the Optical Emission Spectroscopy (OES) technique are described; then, some rules to consider during the spectral analysis to avoid ambiguities are listed -- Finally, some of the more frequently used spectroscopic methods for determining the physical properties of plasma are described

• Autores: Devia, D. M.; Rodriguez-Restrepo, L. V.; Restrepo-Parra, E.
• Fecha de publicación: 2014
• Institución: Universidad EAFIT
• Repositorio: Repositorio EAFIT
• Idioma: eng
• OAI Identifier: oai:repository.eafit.edu.co:10784/5300
• Acceso en línea: http://hdl.handle.net/10784/5300
• Palabra clave: ESPECTROSCOPIA DE EMISIÓN; ANÁLISIS ESPECTRAL; ESPECTROSCOPIA DE PLASMA; ANÁLISIS ESPECTRAL; PELÍCULAS DELGADAS; Emission spectroscopy; Spectrum analysis; Plasma spectroscopy; Spectrum analysis; Thin films
• License: Copyright (c) 2015 Ingeniería y Ciencia – ing.cienc.